The Instrumentation Division seeks an exceptional Postdoctoral Research Associate to join a research effort on characterization of advanced microelectronic structures using ptychographic imaging techniques being developed at NSLS-II. The x-ray metrology pipeline will be utilized for characterization of microelectronic structures being developed at IO and performing x-ray measurements at NSLS-II. Examples of target areas include (but are not limited to): (i) characterization of defects due to electromigration effects in high-current density interconnects, (ii) characterization of mechanical stress and radiation-damage effects in photonics components integrated on a conventional silicon substrate and (iii) preparation of samples to be used for x-ray experiments at NSLS-II. The selected candidate will work with a team of scientists from NSLS-II, CFN (Centers for Functional Nanomaterials), CSI (Computational Science Initiative), and IO (Instrumentation Division), plus other postdoctoral researchers who are working on different aspects of the project (i.e., development of ptychographic imaging techniques, performing simulations and experiments that incorporate latest machine-learning algorithms). Furthermore, the successful candidate will collaborate broadly with the other members of IO and CFN, leveraging their expertise in design and fabrication of microelectronics.
This is a 2 year appointment.
Essential Duties and Responsibilities:
Design and fabricate test patterns and microelectronics samples for x-ray characterizations.
Explore a method for producing volumetric dataset corresponding to the test pattern, to be used for x-ray imaging simulations.
Perform laboratory measurements.
Perform x-ray scattering, diffraction, and imaging experiments at NSLS-II.
Collaborate with researchers at NSLS-II, CFN, CSI, and IO, taking advantage of their expertise to achieve the research goal.
Publish the results in peer-reviewed journals and present them at conferences.
POSITION REQUIREMENTS:
Required Knowledge, Skills, and Abilities:
Ph.D. in Electrical Engineering, Computer Engineering, Computer Science, Physics, Material Science, or related discipline.
Demonstrated expertise in research and development of microelectronics systems (i.e., devices and integrated circuits).
Hands-on experience with structural characterizations relevant to investigating microelectronic systems (i.e., x-ray or electron imaging, critical-dimension small angle scattering, or x-ray diffraction).
Demonstrated experience in computational programming for producing volumetric dataset (corresponding to the test pattern’s 3D structure).
Excellent oral and written communication skills.
Excellent publication or presentation records in the related areas.
Ability to work independently as well as effectively in a collaborative team environment for solving scientific problems.
Preferred Knowledge, Skills, and Abilities:
Demonstrated experience in programming (e.g., Python).
Experience in technologies (e.g. nanofabrication) relevant to microelectronics
Experience with SEM/TEM
Experience with x-ray imaging
Experience with analytical testing integrated circuits or microelectronics systems.
Familiarity with integrated circuit design processes, flows, CAD, and EDA tools.
Experience with x-ray scattering or imaging. Synchrotron experience is preferred.
OTHER INFORMATION:
Initial 2-year term appointment subject to renewal contingent on performance and funding.
BNL policy requires that after obtaining a PhD, eligible candidates for research associate appointments may not exceed a combined total of 5 years of relevant work experience as a post-doc and/or in an R&D position, excluding time associated with family planning, military service, illness or other life-changing events.
This is a fully onsite position located at BNL in Upton, NY.
Brookhaven National Laboratory is committed to providing fair, equitable and competitive compensation. The full salary range for this position is $70200 - $116200 / year. Salary offers will be commensurate with the final candidate’s qualification, education and experience and considered with the internal peer group.
