Organization Overview:
The Center for Functional Nanomaterials (CFN) at Brookhaven is a DOE-funded national scientific user facility, offering users a supported research experience with top-caliber scientists and access to state-of-the- art instrumentation. The CFN mission is advancing nanoscience through frontier fundamental research and technique development and is the nexus of a broad collaboration network. Each year, CFN staff members support the research of nearly 600 external facility users.
Three strategic nanoscience themes underlie the CFN scientific facilities: The CFN conducts research on nanomaterial synthesis by assembly designing precise architectures with targeted functionality by organizing nanoscale components. The CFN researches and applies platforms for state-of-the-art techniques for Accelerated Nanomaterial Discovery, integrating synthesis, advanced characterization, physical modeling, and computer science to iteratively explore a wide range of material parameters. The CFN develops and utilizes advanced capabilities for studies of Nanomaterials in Operando Conditions for characterizing materials and reactions at the atomic scale in real-world environments.
Position Description:
The CFN is seeking a talented Postdoctoral Research Associate to conduct research on developing novel hybrid photoresist materials for extreme ultraviolet (EUV) lithography by synthesizing organic-inorganic hybrid thin films via atomic layer deposition (ALD) techniques, especially vapor-phase infiltration (VPI). You will explore the materials chemistry, EUV exposure mechanisms, high-resolution patterning performance, and dry-etching characteristics of the synthesized hybrid resists by utilizing electron beam lithography (EBL), low-energy electron exposure, infrared (IR) spectroscopy, and EUV lithography. This work is part of a larger effort to design photoresist materials for the next-generation EUV lithography for Angstrom-era semiconductor chip manufacturing. You will work under the supervision of Dr. Chang-Yong Nam (Electronic Nanomaterials Group).
Essential Duties and Responsibilities:
You will synthesize and characterize organic-inorganic hybrid thin films applicable to EBL and EUV lithography by leveraging ALD techniques including VPI.
You will perform in-depth materials characterization on organic-inorganic hybrid resists and measure their EBL & EUV lithography patterning as well as dry etching characteristics as a function of synthesis parameters and materials composition.
You will explore new material compositions, EUV exposure mechanisms, and EUV photochemistry for improving the performance of vapor-synthesized hybrid EUV photoresists.
You will collaborate with scientific staff with diverse backgrounds including materials science & chemistry, nanofabrication, and advanced characterizations including those based on synchrotron beamline techniques.
You will disseminate research findings via paper publications and external presentations.
Required Knowledge, Skills, and Abilities:
You have a Ph.D. in a relevant discipline (Materials Science, Chemical Engineering, Chemistry, or a related engineering discipline), conferred within the past five years or to be completed prior to the starting date.
You have demonstrated experimental expertise in the synthesis of organic-inorganic hybrid thin films using ALD techniques, including VPI, and their characterization using low-energy electron microscopy (LEEM)/X-ray photoemission electron microscopy (XPEEM), EBL & EUV lithography, atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), inductively-coupled plasma reactive ion etching (ICP-RIE), and other characterization methods including transmission electron microscopy (TEM).
You have demonstrated experimental experience in nanofabrication processes (e.g., EBL, physical vapor deposition, ALD etc.) and critical dimension (CD) measurements & analysis using scanning electron microscopy (SEM) and CD analysis software.
You communicate effectively, verbally and in writing, evidenced by peer-reviewed publications and conference presentations/proceedings.
You are committed to creative and independent research, teamwork, and fostering an environment of safe scientific work practices.
Preferred Knowledge, Skills, and Abilities:
You have hands-on experimental experience with applying VPI-based hybridization using various organic templates, including but not limited to self-assembled block copolymer thin films, lithographically patterned polymer structures, and other exotic templates.
You have experience in performing EUV patterning using shifts for the Micro Exposure Tool 5 (MET5)—a 0.55 NA EUV lithography patterning beamline—at Advanced Light Source of the Lawrence Berkeley National Laboraotry.
You have experience in optimizing the patterning performance of hybrid resists by engineering materials chemistry and lithography patterning process parameters.
You have experience or working knowledge of the synthesis of organic-inorganic hybrid thin films using molecular layer deposition (MLD).
You have experience in materials characterization and analysis relevant for organic-inorganic hybrid thin films, including but not limited to ellipsometry, X-ray scattering, X-ray reflectivity, and IR spectroscopy.
Other Information:
This is a 2-year Postdoc Assignment.
BNL policy requires that after obtaining a PhD, eligible candidates for research associate appointments may not exceed a combined total of 5 years of relevant work experience as a post- doc and/or in an R&D position, excluding time associated with family planning, military service, illness, or other life-changing events.
Brookhaven Laboratory is committed to providing fair, equitable and competitive compensation. The full salary range for this position is $71900 - $80000 / year. Salary offers will be commensurate with the final candidate’s qualification, education and experience and considered with the internal peer group
